- 活性离子束
- reactive: adj. 1.反动的，倒退的，复古的。 2.反应的；反作 ...
- ion: n. 【物理学】离子。 positive [negati ...
- beam: n. 1.梁，栋梁，桁条；(船的)横梁。 2.船幅；(动 ...
- reactive ion beam etch: 活性离子束腐蚀
- reactive ion beam etching: 反应离子束刻蚀
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reactive ion beam中文什么意思
- 活性离子束
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例句与用法
- Reactive ion beam etching system ribe system
反应性离子束蚀刻系统 - The feasibility that kaufman ion source is applied in reactive ion beam etching is discussed . etching characteristics of materials , including pr , cr , quartz , are investigated . the etch rate and mechanisms of such materials are measured and analyzed as a function of ion energy , ion beam density and ion incidence angle in pure ar and chf3 , respectively . the etch rate has shown a square root dependence on variation versus
深入研究了光刻胶、铬薄膜、石英等光学材料离子束刻蚀特性,分别以ar气和chf3为工作气体,研究光刻胶、铬薄膜、石英等的刻蚀速率随离子能量,束流密度和离子入射角度的变化关系,得到刻蚀速率与影响因素的拟合方程,为掩模的制作工艺路线提供了实验依据和理论指导。